Model G6-E

Model G6-E


Specifications
Details

Combustion-type exhaust abatement system capable of simultaneous abatement of large volumes of hydrogen and chlorine gas
  • Combustion-type exhaust abatement systems
  • Treat large volumes of chlorine gas and hydrogen gas simultaneously
  • Batch treatment of multiple gas types
  • Highly efficient abatement of PFCs
  • Byproduct removal measures/automatic removal of powdery byproducts
  • Low running cost
  • On-demand operation
  • Greater ease of maintenance

Features and Benefits

Model G6-E is a combustion-type exhaust abatement system suited to the treatment of large volumes of gases containing hydrogen and chlorine used for epitaxial growth and other systems in processes to manufacture semiconductors. With a compact design, it is able to treat hydrogen at up to 200 L/min. Capable of treating chlorine gas and hydrogen gas simultaneously. Byproduct removal function installed as standard, reducing maintenance costs and load.

Specifications

 
Model Unit G6-E A1~A4 G6-E P1~P4
Abatement method burn+ wet burn+ wet
Max. inflow gas volume L/min 400 400
Fuel City gas Propane gas
Dimensions W x D x H mm 1,200×650×1,900mm 1,200×650×1,900mm
H₂ abatement L/min 200 200
Gases (e.g.) Process (depo) gases
H2, PH3, Si3H8, SiH4, PH3, GeH4, AsH3, NH3, SiH2Cl2, B2H6, etc.
Cleaning gases - all types
NF3, ClF3, HF, F2, HCl, COF2, etc.
Etching gases – all types
HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.
Process (depo) gases
H2, PH3, Si3H8, SiH4, PH3, GeH4, AsH3, NH3, SiH2Cl2, B2H6, etc.
Cleaning gases - all types
NF3, ClF3, HF, F2, HCl, COF2, etc.
Etching gases – all types
HBr, Cl2, SiCl4, BCl3, CO, C5F8, C4F6, etc.
Standard equipment Large flow-rate H2 abatement burner Large flow-rate H2 abatement burner
Burner scraper for powder removal Burner scraper for powder removal
Options City water/drainage consumption reduction unit City water/drainage consumption reduction unit
Fan scrubber for reduction of powder emissions Fan scrubber for reduction of powder emissions

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